Y. Ohki, Y. Toyoda, H. Kobayasi and I. Akasaki: “Fabrication and properties of a practical blue-emitting GaN m-i-s diode”, Inst. Phys. Conf. Ser., No. 63, Chap. 10, pp. 479-484
Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer (Amano, H., Sawaki, N., Akasaki, I. and Toyoda, Y.). Applied Physics Letters 48: 353-355.
1989年
Effects of AlN Buffer Layer on Crystallographic Structure and on Electrical and Optical Properties of GaN and Ga1-xAlxN (0<x≤0.4) Films Grown on Sapphire Substrate by MOVPE (Akasaki, I., Amano, H., Koide, Y., Hiramatsu, K. and Sawaki, N.). Journal of Crystal Growth 98: 209-219.
P-Type Conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation (LEEBI) (Amano, H., Kito, M., Hiramatsu, K. and Akasaki, I.). Japanese Journal of Applied Physics 28: L2112-L2114.
1990年
H. Amano, T. Asahi and I. Akasaki: “Stimulated Emission Near Ultraviolet at Room Temperature from a GaN Film Grown on Sapphire by MOVPE Using an AlN Buffer Layer”, Jpn. J. Appl. Phys., Vol. 29, No. 2, pp. L205-L206, 1990.
1991年
H. Murakami, T. Asahi, H. Amano, K. Hiramatsu, N. Sawaki and I. Akasaki: “Growth of Si-doped AlxGa1-xN on (0001) sapphire substrate by metalorganic vapor phase epitaxy”, J. Crystal Growth, Vol. 115, pp. 648-651
1995年
I. Akasaki, H. Amano, S. Sota, H. Sakai, T. Tanaka and M. Koike: “Stimulated Emission by Current Injection from an AlGaN/GaN/GaInN Quantum Well Device”, Jpn. J. Appl. Phys., Vol. 34, Pt. 2, No. 11B, pp. L1517-L1519
1997年
Crystal Growth and Conductivity Control of Group III Nitride Semiconductors and Their Application to Short Wavelength Light Emitters (Akasaki, I. and Amano, H.). Japanese Journal of Applied Physics 36: 5393-5408.
2006年
Breakthroughs in Improving Crystal Quality of GaN and Invention of the p-n Junction Blue-Light-Emitting Diode (Akasaki, I. and Amano, H.). Japanese Journal of Applied Physics 45: 9001-9010.