Semiconductor device fabrication
MOSFET scaling (process nodes)
020 μm – 1968 010 μm – 1971 006 μm – 1974 003 μm – 1977  1.5 μm – 1981 001 μm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 090 nm – 2003 065 nm – 2005 045 nm – 2007 032 nm – 2009 028 nm – 2010 022 nm – 2012 014 nm – 2014 010 nm – 2016 007 nm – 2018 005 nm – 2020 003 nm – 2022
Future 002 nm ~ 2025
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
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The 6 μm process (6 micrometers) is the level of semiconductor process technology that was reached around 1974^[1][2] by companies such as Intel.

The 6 μm process refers to the minimum size that could be reliably produced. The smallest transistors and other circuit elements on a chip made with this process were around 6 micrometers wide.

• Intel 8080 CPU launched in 1974 was manufactured using this process.^[3]
• Zilog Z80 launched in 1976 was manufactured in 4 μm.^[4][5]
• Intel 2116 and Mostek 4116 16K DRAMs were introduced in 1975 and 1976, respectively. ^[6]

• Brief timeline of microprocessor development

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