Academic journal
The Journal of Vacuum Science and Technology is a peer-reviewed scientific journal published in two parts, A and B , by the American Institute of Physics on behalf of the American Vacuum Society . It was established in 1964 and the editor-in-chief is Eray Aydil (University of Minnesota ).
History
1964–1982 Journal of Vacuum Science and Technology
1983–present Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
1983–1990 Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
1991–present Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Part A
Part A covers applied surface science , electronic materials and processing, fusion technology, plasma technology, surface science , thin films , vacuum metallurgy , and vacuum technology. According to the Journal Citation Reports , the journal has a 2015 impact factor of 1.724.[ 1]
Part B
Part B covers vacuum and plasma processing of various materials, their structural characterization, microlithography , and the physics and chemistry of submicrometer and nanometer structures and devices. According to the Journal Citation Reports , the journal has a 2014 impact factor of 1.398.[ 2]
References
External links